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Please use this identifier to cite or link to this item: http://hdl.handle.net/10928/458

Title: MgOスパッタ薄膜の構造特性 : 絶縁破壊およびスクラッチ損傷
Other Titles: Structural Properties of Sputtered MgO Films : Dielectric Breakdown and Scratch Failure
Authors: 江上, 傑
村瀬, 史弥
田端, 美咲
小曾根, 良介
中野, 武雄
馬場, 茂
EGAMI, Takashi
MURASE, Fumiya
TABATA, Misaki
KOSONE, Ryosuke
BABA, Shigeru
Keywords: MgO
Dielectric breakdown
Scratch failure
Issue Date: 1-Dec-2013
Publisher: 成蹊大学理工学部
Abstract: Structural properties of magnesium oxide (MgO) thin films are discussed from the dielectric breakdown measurement. Films of MgO of about 80 nm in thickness were prepared by rf-sputtering in an argon atmosphere at pressures of 0.24, 1.32 and 2.85 Pa. The breakdown took place suddenly in a staircase voltage-elevation measurement. Films sputtered at low pressures had a high breakdown strength. We observed a slow breakdown by employing the current-limitation mode, and a characteristic behavior appeared in the I-V profiles. As the current increased, the voltage was apt to decrease in films sputtered at 0.24 Pa, but it increased in films prepared at high pressures. The difference also appeared in the surface morphology of the breakdown points and the mechanical damage of the films in the scratch test. The correlation suggests that the grain boundary structure of MgO films plays an important role on these fracture properties.
URI: http://hdl.handle.net/10928/458
Appears in Collections:第50巻第2号

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